Alex Robinson

Publications

  1. Published
  2. Published

    A Chemically Amplified Fullerene-Derivative Molecular Electron-Beam Resist

    Mayandithevar Manickam, Jon Preece, Richard Palmer & Alex Robinson, 3 Dec 2007, In: Small. 3, 12, p. 2076 1 p.

    Research output: Contribution to journalArticle

  3. Published

    A Fullerene derivative as an electron beam resist for nanolithography

    Alex Robinson, Rebecca Palmer, , & Jon Preece, 1998, In: Applied Physics Letters.

    Research output: Contribution to journalArticlepeer-review

  4. Published

    A high resolution water soluble fullerene molecular resist for electron beam lithography

    Richard Palmer & Alex Robinson, 9 Jul 2008, In: Nanotechnology. 19, 27, p. 275308-

    Research output: Contribution to journalArticle

  5. Published

    A triphenylene derivative as a novel negative/positive tone resist of 10 nanometer resolution

    Alex Robinson, Richard Palmer, , Jon Preece & Ken Harris, 1 Jun 2000, p. 425-428. 4 p.

    Research output: Contribution to conference (unpublished)Paper

  6. Published
  7. Published
  8. Published
  9. Published
  10. Published

    Chemically amplified fullerene resists for e-beam lithography

    Sara Diegoli, Mayandithevar Manickam, Jon Preece, Rebecca Palmer & Alex Robinson, 2008, Proceedings of SPIE - The International Society for Optical Engineering.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  11. Published
  12. Published

    Chemically amplified fullerene resists for e-beam lithography

    Sara Diegoli, Mayandithevar Manickam, Jon Preece, Richard Palmer & Alex Robinson, 1 Jan 2008.

    Research output: Contribution to conference (unpublished)Paper

  13. Published

    Chemically amplified fullerene resists, spin-on fullerene hardmasks and high aspect ratio etching

    Andreas Frommhold, , , Mayandithevar Manickam, Edward Tarte, Jon Preece, Richard Palmer, Alex Robinson & Edward Tarte, 2012, Proceedings of the IEEE Conference on Nanotechnology. 6322209

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  14. Published

    Chemically amplified molecular resists for E-beam lithography

    Sara Diegoli, Mayandithevar Manickam, Jon Preece, Rebecca Palmer & Alex Robinson, 2007, Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  15. Published
  16. Published
  17. Published
  18. Published

    Chemically amplified molecular resists for electron beam lithography

    Alex Robinson, , , Richard Palmer, Mayandithevar Manickam, Jon Preece, , & , 1 Apr 2006, p. 1115-1118. 4 p.

    Research output: Contribution to conference (unpublished)Paper

  19. Published

    Chemically amplified phenolic fullerene electron beam resist

    Richard Palmer & Alex Robinson, 28 Feb 2014, In: Journal of Materials Chemistry C. 2, 8, p. 1505-1512

    Research output: Contribution to journalArticlepeer-review

  20. Published
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