Organic hard masks utilizing fullerene derivatives

Richard Palmer; Andreas Frommhold; Alexander Robinson; Alan Brown; Tom Lada

doi:10.1117/12.2085675

Organic hard masks utilizing fullerene derivatives

Richard Palmer, Andreas Frommhold, Alexander Robinson, Alan Brown, Tom Lada

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

5 Citations (Scopus)

Abstract

We have developed a series of fullerene containing materials for use as organic hard masks. Films with a thickness of up to 250 nm were deposited via spin coating. After a crosslinking bake the films exhibit good thermal stability – in the best case a mass loss of less than 3% at 400 °C is seen. Etch resistance of the different formulations are presented and hig-hresolution patterning is demonstrated. During the transfer into silicon no adverse “wiggling” is observed at high resolution. We attribute this to the low levels of aliphatic hydrogen present in the materials. © (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.

Original language	English
Title of host publication	Organic hard masks utilizing fullerene derivatives
DOIs	https://doi.org/10.1117/12.2085675
Publication status	Published - 20 Mar 2015

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10.1117/12.2085675

Materials Program Platform Grant : Nanostructured Surfaces
Palmer, R. (Principal Investigator), Guo, Q. (Co-Investigator), Li, Z. (Co-Investigator), Kaplan, A. (Co-Investigator) & Robinson, A. (Co-Investigator)
Engineering & Physical Science Research Council
1/07/07 → 31/12/11
Project: Research Councils

Cite this

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title = "Organic hard masks utilizing fullerene derivatives",

abstract = "We have developed a series of fullerene containing materials for use as organic hard masks. Films with a thickness of up to 250 nm were deposited via spin coating. After a crosslinking bake the films exhibit good thermal stability – in the best case a mass loss of less than 3% at 400 °C is seen. Etch resistance of the different formulations are presented and hig-hresolution patterning is demonstrated. During the transfer into silicon no adverse “wiggling” is observed at high resolution. We attribute this to the low levels of aliphatic hydrogen present in the materials. {\textcopyright} (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.",

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AU - Palmer, Richard

AU - Frommhold, Andreas

AU - Robinson, Alexander

AU - Brown, Alan

AU - Lada, Tom

PY - 2015/3/20

Y1 - 2015/3/20

N2 - We have developed a series of fullerene containing materials for use as organic hard masks. Films with a thickness of up to 250 nm were deposited via spin coating. After a crosslinking bake the films exhibit good thermal stability – in the best case a mass loss of less than 3% at 400 °C is seen. Etch resistance of the different formulations are presented and hig-hresolution patterning is demonstrated. During the transfer into silicon no adverse “wiggling” is observed at high resolution. We attribute this to the low levels of aliphatic hydrogen present in the materials. © (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.

AB - We have developed a series of fullerene containing materials for use as organic hard masks. Films with a thickness of up to 250 nm were deposited via spin coating. After a crosslinking bake the films exhibit good thermal stability – in the best case a mass loss of less than 3% at 400 °C is seen. Etch resistance of the different formulations are presented and hig-hresolution patterning is demonstrated. During the transfer into silicon no adverse “wiggling” is observed at high resolution. We attribute this to the low levels of aliphatic hydrogen present in the materials. © (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.

U2 - 10.1117/12.2085675

DO - 10.1117/12.2085675

M3 - Conference contribution

BT - Organic hard masks utilizing fullerene derivatives

ER -

Organic hard masks utilizing fullerene derivatives

Abstract

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Projects

Materials Program Platform Grant : Nanostructured Surfaces

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