Alex Robinson (Inventor), Jon Preece (Inventor), Richard Palmer (Inventor), Andreas Frommhold (Inventor), Dongxu Yang (Inventor), Alexandra McClelland (Inventor), Drew Athens (Inventor), Xiang Xu (Inventor)

Research output: Patent


The present disclosure relates to novel methanofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.
Original languageEnglish
Patent number9256126
Publication statusPublished - 9 Feb 2016


Dive into the research topics of 'Methanofullerenes'. Together they form a unique fingerprint.

Cite this