Chemically amplified fullerene resists for e-beam lithography

Jedsada Manyam, FP Gibbons, Sara Diegoli, Mayandithevar Manickam, Jon Preece, Richard Palmer, Alexander Robinson

Research output: Contribution to conference (unpublished) › Paper

Original language	English
Publication status	Published - 1 Jan 2008
Event	Advances in Resist Materials and Processing Technology, XXV - San Jose, United States Duration: 24 Feb 2008 → …

Conference	Advances in Resist Materials and Processing Technology, XXV
Country/Territory	United States
City	San Jose
Period	24/02/08 → …

Cite this

@conference{812e15be42584140bff30f24eb52b877,

title = "Chemically amplified fullerene resists for e-beam lithography",

author = "Jedsada Manyam and FP Gibbons and Sara Diegoli and Mayandithevar Manickam and Jon Preece and Richard Palmer and Alexander Robinson",

year = "2008",

month = jan,

day = "1",

language = "English",

note = "Advances in Resist Materials and Processing Technology, XXV ; Conference date: 24-02-2008",

}