Advances in component synthesis leading to performance improvements for multi-trigger resist

Carmen Popescu, Greg O'callaghan, Alex Mcclelland, John Roth, Edward Jackson, Philipp H. Fackler, Ralph Dammel, Mansour Moinpour, Kun Si, Alex P. G. Robinson

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

One approach for a novel EUV resist is the multi-trigger concept wherein a reaction will only occur when multiple elements of the resist are initiated concurrently and in close spatial proximity. We present results focused on the enhancement of the high-opacity MTR resist which shows a decrease in dose and improvement in Z-factor using a higher activation energy MTR molecule for pitch 32nm dense lines. We present pillars at p40 with a diameter of 24nm, dose of 72mJ/cm2, with a CDU of 2.63nm.
Original languageEnglish
Title of host publicationInternational Conference on Extreme Ultraviolet Lithography 2021
EditorsKurt G. Ronse, Patrick P. Naulleau, Paolo A. Gargini, Toshiro Itani, Eric Hendrickx
PublisherSociety of Photo-Optical Instrumentation Engineers
Pages32
ISBN (Electronic)9781510645530
ISBN (Print)9781510645523
DOIs
Publication statusPublished - 29 Sep 2021
EventInternational Conference on Extreme Ultraviolet Lithography 2021 - Online Only, United States
Duration: 27 Sep 20212 Oct 2021

Publication series

NameProceedings of SPIE
PublisherSPIE
Volume11854
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceInternational Conference on Extreme Ultraviolet Lithography 2021
Period27/09/212/10/21

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