Advances in component synthesis leading to performance improvements for multi-trigger resist

Carmen Popescu; Greg O'callaghan; Alex Mcclelland; John Roth; Edward Jackson; Philipp H. Fackler; Ralph Dammel; Mansour Moinpour; Kun Si; Alex P. G. Robinson

doi:10.1117/12.2600966

Advances in component synthesis leading to performance improvements for multi-trigger resist

Carmen Popescu, Greg O'callaghan, Alex Mcclelland, John Roth, Edward Jackson, Philipp H. Fackler, Ralph Dammel, Mansour Moinpour, Kun Si, Alex P. G. Robinson

Chemical Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

One approach for a novel EUV resist is the multi-trigger concept wherein a reaction will only occur when multiple elements of the resist are initiated concurrently and in close spatial proximity. We present results focused on the enhancement of the high-opacity MTR resist which shows a decrease in dose and improvement in Z-factor using a higher activation energy MTR molecule for pitch 32nm dense lines. We present pillars at p40 with a diameter of 24nm, dose of 72mJ/cm2, with a CDU of 2.63nm.

Original language	English
Title of host publication	International Conference on Extreme Ultraviolet Lithography 2021
Editors	Kurt G. Ronse, Patrick P. Naulleau, Paolo A. Gargini, Toshiro Itani, Eric Hendrickx
Publisher	Society of Photo-Optical Instrumentation Engineers
Pages	32
ISBN (Electronic)	9781510645530
ISBN (Print)	9781510645523
DOIs	https://doi.org/10.1117/12.2600966
Publication status	Published - 29 Sept 2021
Event	International Conference on Extreme Ultraviolet Lithography 2021 - Online Only, United States Duration: 27 Sept 2021 → 2 Oct 2021

Publication series

Name	Proceedings of SPIE
Publisher	SPIE
Volume	11854
ISSN (Print)	0277-786X
ISSN (Electronic)	1996-756X

Conference

Conference	International Conference on Extreme Ultraviolet Lithography 2021
Period	27/09/21 → 2/10/21

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10.1117/12.2600966Licence: None: All rights reserved

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Popescu, C., O'callaghan, G., Mcclelland, A., Roth, J., Jackson, E., Fackler, P. H., Dammel, R., Moinpour, M., Si, K., & Robinson, A. P. G. (2021). Advances in component synthesis leading to performance improvements for multi-trigger resist. In K. G. Ronse, P. P. Naulleau, P. A. Gargini, T. Itani, & E. Hendrickx (Eds.), International Conference on Extreme Ultraviolet Lithography 2021 (pp. 32). Article 118540P (Proceedings of SPIE; Vol. 11854). Society of Photo-Optical Instrumentation Engineers. https://doi.org/10.1117/12.2600966

Popescu, Carmen ; O'callaghan, Greg ; Mcclelland, Alex et al. / Advances in component synthesis leading to performance improvements for multi-trigger resist. International Conference on Extreme Ultraviolet Lithography 2021. editor / Kurt G. Ronse ; Patrick P. Naulleau ; Paolo A. Gargini ; Toshiro Itani ; Eric Hendrickx. Society of Photo-Optical Instrumentation Engineers, 2021. pp. 32 (Proceedings of SPIE).

@inproceedings{fbe2657ca6de4e22ac590d7c588c038c,

title = "Advances in component synthesis leading to performance improvements for multi-trigger resist",

abstract = "One approach for a novel EUV resist is the multi-trigger concept wherein a reaction will only occur when multiple elements of the resist are initiated concurrently and in close spatial proximity. We present results focused on the enhancement of the high-opacity MTR resist which shows a decrease in dose and improvement in Z-factor using a higher activation energy MTR molecule for pitch 32nm dense lines. We present pillars at p40 with a diameter of 24nm, dose of 72mJ/cm2, with a CDU of 2.63nm.",

author = "Carmen Popescu and Greg O'callaghan and Alex Mcclelland and John Roth and Edward Jackson and Fackler, {Philipp H.} and Ralph Dammel and Mansour Moinpour and Kun Si and Robinson, {Alex P. G.}",

year = "2021",

month = sep,

day = "29",

doi = "10.1117/12.2600966",

language = "English",

isbn = "9781510645523",

series = "Proceedings of SPIE",

publisher = "Society of Photo-Optical Instrumentation Engineers",

pages = "32",

editor = "Ronse, {Kurt G.} and Naulleau, {Patrick P.} and Gargini, {Paolo A.} and Toshiro Itani and Eric Hendrickx",

booktitle = "International Conference on Extreme Ultraviolet Lithography 2021",

address = "United States",

note = "International Conference on Extreme Ultraviolet Lithography 2021 ; Conference date: 27-09-2021 Through 02-10-2021",

}

Popescu, C, O'callaghan, G, Mcclelland, A, Roth, J, Jackson, E, Fackler, PH, Dammel, R, Moinpour, M, Si, K & Robinson, APG 2021, Advances in component synthesis leading to performance improvements for multi-trigger resist. in KG Ronse, PP Naulleau, PA Gargini, T Itani & E Hendrickx (eds), International Conference on Extreme Ultraviolet Lithography 2021., 118540P, Proceedings of SPIE, vol. 11854, Society of Photo-Optical Instrumentation Engineers, pp. 32, International Conference on Extreme Ultraviolet Lithography 2021, 27/09/21. https://doi.org/10.1117/12.2600966

Advances in component synthesis leading to performance improvements for multi-trigger resist. / Popescu, Carmen; O'callaghan, Greg; Mcclelland, Alex et al.
International Conference on Extreme Ultraviolet Lithography 2021. ed. / Kurt G. Ronse; Patrick P. Naulleau; Paolo A. Gargini; Toshiro Itani; Eric Hendrickx. Society of Photo-Optical Instrumentation Engineers, 2021. p. 32 118540P (Proceedings of SPIE; Vol. 11854).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - Advances in component synthesis leading to performance improvements for multi-trigger resist

AU - Popescu, Carmen

AU - O'callaghan, Greg

AU - Mcclelland, Alex

AU - Roth, John

AU - Jackson, Edward

AU - Fackler, Philipp H.

AU - Dammel, Ralph

AU - Moinpour, Mansour

AU - Si, Kun

AU - Robinson, Alex P. G.

PY - 2021/9/29

Y1 - 2021/9/29

N2 - One approach for a novel EUV resist is the multi-trigger concept wherein a reaction will only occur when multiple elements of the resist are initiated concurrently and in close spatial proximity. We present results focused on the enhancement of the high-opacity MTR resist which shows a decrease in dose and improvement in Z-factor using a higher activation energy MTR molecule for pitch 32nm dense lines. We present pillars at p40 with a diameter of 24nm, dose of 72mJ/cm2, with a CDU of 2.63nm.

AB - One approach for a novel EUV resist is the multi-trigger concept wherein a reaction will only occur when multiple elements of the resist are initiated concurrently and in close spatial proximity. We present results focused on the enhancement of the high-opacity MTR resist which shows a decrease in dose and improvement in Z-factor using a higher activation energy MTR molecule for pitch 32nm dense lines. We present pillars at p40 with a diameter of 24nm, dose of 72mJ/cm2, with a CDU of 2.63nm.

U2 - 10.1117/12.2600966

DO - 10.1117/12.2600966

M3 - Conference contribution

SN - 9781510645523

T3 - Proceedings of SPIE

SP - 32

BT - International Conference on Extreme Ultraviolet Lithography 2021

A2 - Ronse, Kurt G.

A2 - Naulleau, Patrick P.

A2 - Gargini, Paolo A.

A2 - Itani, Toshiro

A2 - Hendrickx, Eric

PB - Society of Photo-Optical Instrumentation Engineers

T2 - International Conference on Extreme Ultraviolet Lithography 2021

Y2 - 27 September 2021 through 2 October 2021

ER -

Popescu C, O'callaghan G, Mcclelland A, Roth J, Jackson E, Fackler PH et al. Advances in component synthesis leading to performance improvements for multi-trigger resist. In Ronse KG, Naulleau PP, Gargini PA, Itani T, Hendrickx E, editors, International Conference on Extreme Ultraviolet Lithography 2021. Society of Photo-Optical Instrumentation Engineers. 2021. p. 32. 118540P. (Proceedings of SPIE). doi: 10.1117/12.2600966

Advances in component synthesis leading to performance improvements for multi-trigger resist

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