Methanofullerenes

Alex Robinson; Jon Preece; Richard Palmer; Andreas Frommhold; Dongxu Yang; Alexandra McClelland; Drew Athens; Xiang Xue

Methanofullerenes

Alex Robinson (Inventor), Jon Preece (Inventor), Richard Palmer (Inventor), Andreas Frommhold (Inventor), Dongxu Yang (Inventor), Alexandra McClelland (Inventor), Drew Athens (Inventor), Xiang Xue (Inventor)

Research output: Patent

Abstract

The present disclosure relates to novel methofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays. Negative photosensitive compositions are also disclosed.

Original language	English
Patent number	9323149
Publication status	Published - 26 Apr 2016

Cite this

@misc{2115f52b3f714c3587373f9f61f9341c,

title = "Methanofullerenes",

abstract = "The present disclosure relates to novel methofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays. Negative photosensitive compositions are also disclosed.",

author = "Alex Robinson and Jon Preece and Richard Palmer and Andreas Frommhold and Dongxu Yang and Alexandra McClelland and Drew Athens and Xiang Xue",

year = "2016",

month = apr,

day = "26",

language = "English",

type = "Patent",

note = "9323149",

}

TY - PAT

T1 - Methanofullerenes

AU - Robinson, Alex

AU - Preece, Jon

AU - Palmer, Richard

AU - Frommhold, Andreas

AU - Yang, Dongxu

AU - McClelland, Alexandra

AU - Athens, Drew

AU - Xue, Xiang

PY - 2016/4/26

Y1 - 2016/4/26

N2 - The present disclosure relates to novel methofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays. Negative photosensitive compositions are also disclosed.

AB - The present disclosure relates to novel methofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays. Negative photosensitive compositions are also disclosed.

M3 - Patent

M1 - 9323149

ER -

Methanofullerenes

Abstract

Fingerprint

Cite this