Irresistible Materials (IM) is a UK company spun out of the University of Birmingham. It is developing novel resist systems based on the Multi-trigger concept, and spin-on-carbon hardmask materials. IM has developed a new EUV resist that is nonmetal based, does not need a post exposure bake (PEB), and delivers high sensitivity, excellent contact hole resolution, with low LER. It is being readied for HVM through a partnership with Nano-C, Inc. (the Massachusetts based manufacturer of advanced electronic materials and chemicals). The transition to scalability will be the highlight of this discussion.
|Number of pages||13|
|Journal||Proceedings of SPIE - The International Society for Optical Engineering|
|Publication status||Published - 18 May 2017|
- EUV Photoresist
- contacts holes
- volume manufacturing
- high resolution