Original language | English |
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Journal | P.Soc.Photo-Opt.Inst.7273, 72733D, 2010 |
Publication status | Published - 1 Jan 2010 |
Characterisation of the Effects of Base Additives on a Fullerene Chemically Amplified Resist
J Manyam, Mayandithevar Manickam, Jon Preece, Richard Palmer, Alexander Robinson
Research output: Contribution to journal › Article