Characterisation of the Effects of Base Additives on a Fullerene Chemically Amplified Resist

J Manyam, Mayandithevar Manickam, Jon Preece, Richard Palmer, Alexander Robinson

Research output: Contribution to journalArticle

Original languageEnglish
JournalP.Soc.Photo-Opt.Inst.7273, 72733D, 2010
Publication statusPublished - 1 Jan 2010

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