Original language | English |
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Journal | Microelectronic Engineering |
DOIs | |
Publication status | Published - 2008 |
Chemically amplified molecular resists for e-beam lithography
F.P. Gibbons, J. Manyam, S. Diegoli, M. Manickam, J.A. Preece, R.E. Palmer, A.P.G. Robinson
Research output: Contribution to journal › Article › peer-review
4
Citations
(Scopus)