A Fullerene–Platinum Complex for Direct Functional Patterning of Single Metal Atom-Embedded Carbon Nanostructures

Dongxu Yang, Xiangyi Chen, Dongsheng He, Andreas Frommhold, Xiaoqing Shi, Stuart A. Boden, Maria A. Lebedeva, Olga V. Ershova, Richard E. Palmer, Ziyou Li, Haofei Shi, Jianzhi Gao, Minghu Pan, Andrei N. Khlobystov, Thomas W. Chamberlain, Alex P. G. Robinson

Research output: Contribution to journalArticlepeer-review

Abstract

The development of patterning materials (“resists”) at the nanoscale involves two distinct trends: one is toward high sensitivity and resolution for miniaturization, the other aims at functionalization of the resists to realize bottom-up construction of distinct nanoarchitectures. Patterning of carbon nanostructures, a seemingly ideal application for organic functional resists, has been highly reliant on complicated pattern transfer processes because of a lack of patternable precursors. Herein, we present a fullerene–metal coordination complex as a fabrication material for direct functional patterning of sub-10 nm metal-containing carbon structures. The attachment of one platinum atom per fullerene molecule not only leads to significant improvement of sensitivity and resolution but also enables stable atomic dispersion of the platinum ions within the carbon matrix, which may gain fundamentally new interest in functional patterning of hierarchical carbon nanostructures.
Original languageEnglish
Pages (from-to)1578-1586
Number of pages9
JournalJournal of Physical Chemistry Letters
Volume13
Issue number6
Early online date9 Feb 2022
DOIs
Publication statusPublished - 17 Feb 2022

Keywords

  • Fullerene
  • Organometallic
  • Lithography
  • Photoresist

ASJC Scopus subject areas

  • Materials Chemistry
  • Organic Chemistry

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