Physics & Astronomy
fullerenes
100%
high aspect ratio
64%
aspect ratio
54%
carbon
42%
lithography
40%
etching
36%
plasma etching
31%
silicon
30%
roughness
26%
photoresists
25%
durability
17%
oxygen plasma
14%
film thickness
13%
silicon films
12%
electron beams
11%
selectivity
11%
coating
10%
requirements
10%
high resolution
9%
fabrication
9%
sensitivity
9%
room temperature
8%
anisotropy
7%
performance
7%
Engineering & Materials Science
Fullerenes
74%
Etching
51%
Aspect ratio
44%
Linewidth
40%
Surface roughness
26%
Silicon
25%
Electron beam lithography
24%
Plasma etching
23%
Extreme ultraviolet lithography
23%
Lithography
17%
Film thickness
17%
Durability
12%
Carbon
12%
Fabrication
11%
Temperature
6%
Chemistry
Fullerene
43%
Etching
43%
Electron Beam
13%
Liquid Film
11%
Plasma
7%
Ambient Reaction Temperature
6%