Research output per year
Research output per year
Project Details
| Short title | EPSRC/FSE Collaboration ref APGR/EPSRC-10-1 - Next Generation Resist Technology for the Semiconductor Industry |
|---|---|
| Status | Finished |
| Effective start/end date | 8/04/11 → 7/07/12 |
Funding
- Engineering & Physical Science Research Council
Fingerprint
Explore the research topics touched on by this project. These labels are generated based on the underlying awards/grants. Together they form a unique fingerprint.
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Chemically amplified fullerene resists, spin-on fullerene hardmasks and high aspect ratio etching
Frommhold, A., Yang, D., Manyam, J., Manickam, M., Tarte, E., Preece, J., Palmer, R., Robinson, A. P. G. & Tarte, E., 2012, Proceedings of the IEEE Conference on Nanotechnology. 6322209Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
5 Citations (Scopus) -
Fullerene-based spin-on-carbon hardmask
Frommhold, A., Manyam, J., Palmer, R. E. & Robinson, A. P. G., 1 Oct 2012, In: Microelectronic Engineering. 98, p. 552-555Research output: Contribution to journal › Article › peer-review
Open AccessFile14 Citations (Scopus)296 Downloads (Pure) -
High aspect ratio etching using a fullerene derivative spin-on-carbon hardmask
Robinson, A., 2012, In: Proceedings of SPIE - The International Society for Optical Engineering. 8328, p. n/a 8328OU.Research output: Contribution to journal › Article › peer-review
11 Citations (Scopus)