Research output: Patent
- School of Chemical EngineeringUniversity of BirminghamEdgbastonB15 2TTUnited Kingdom
- IRRESISTIBLE MATERIALS LTD
The present disclosure relates to novel methanofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.
|Publication status||Published - 9 Feb 2016|