Methanofullerenes

Research output: Patent

Authors

  • A.P.G. Robinson (Inventor)
  • Dongxu Yang (Inventor)
  • Alexandra McClelland (Inventor)
  • Drew Athens (Inventor)
  • Xiang Xu (Inventor)

Colleges, School and Institutes

External organisations

  • School of Chemical EngineeringUniversity of BirminghamEdgbastonB15 2TTUnited Kingdom
  • IRRESISTIBLE MATERIALS LTD

Abstract

The present disclosure relates to novel methanofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.

Details

Original languageEnglish
Patent number9256126
Publication statusPublished - 9 Feb 2016