Original language | English |
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Pages (from-to) | 115-118 |
Number of pages | 4 |
Journal | Microelectronic Engineering |
Volume | 83 |
Publication status | Published - 1 Jan 2006 |
Chemically amplified molecular resists for electron beam lithography
Sara Diegoli, Alexander Robinson, HM Zaid, FP Gibbons, Richard Palmer, Mayandithevar Manickam, Jon Preece, R Brainard, T Zampini, K O'Connell
Research output: Contribution to journal › Article
32
Citations
(Scopus)