Chemically amplified molecular resists for electron beam lithography

Sara Diegoli, Alexander Robinson, HM Zaid, FP Gibbons, Richard Palmer, Mayandithevar Manickam, Jon Preece, R Brainard, T Zampini, K O'Connell

Research output: Contribution to journalArticle

32 Citations (Scopus)
Original languageEnglish
Pages (from-to)115-118
Number of pages4
JournalMicroelectronic Engineering
Publication statusPublished - 1 Jan 2006

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