Abstract
Metasurfaces with sub-wavelength nanoscale features have emerged as a platform to achieve desirable electromagnetic responses. However, it remains technically challenging to fabricate metasurfaces in large size and at low cost for mass production. This work demonstrates a 200 mm wafer-scale Al:ZnO metasurface coating based on deep-UV lithography. The metasurfaces are targeted to achieve infrared (IR) reflectivity and emissivity characteristics at bandwidths across the two atmospheric windows in the IR spectrum. The wafers demonstrate a high uniformity of optical response with tailored reflectivity of around 50% at the 3–5 µm mid-wave IR band and less than 10% at the 8–13 µm long-wave IR band. This article furthermore shows that the design principle allows achieving a wide range of dual-band reflectivity values using a single underlying materials stack, offering a versatile platform. The proposed approach is compatible with CMOS-compatible mass-production manufacturing and brings IR metasurface coatings closer to commercially relevant and scalable technology.
Original language | English |
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Article number | 2200452 |
Number of pages | 10 |
Journal | Advanced Optical Materials |
Volume | 10 |
Issue number | 17 |
Early online date | 19 Jun 2022 |
DOIs | |
Publication status | Published - 5 Sept 2022 |
Bibliographical note
Funding Information:The authors acknowledge the funding from DASA/Dstl under Grant Award No. ACC6011239. O.L.M. acknowledges the support from EPSRC grant EP/M009122/1. The authors acknowledge Malvern Optical Ltd for its support with Directional hemispherical reflectance (DHR) measurements and useful discussions with Dr. Peter Raven from Malvern Optical Ltd. The authors thank the Southampton “Cornerstone” wafer-scale processing facility for its expertise in DUV lithography.
Publisher Copyright:
© 2022 The Authors. Advanced Optical Materials published by Wiley-VCH GmbH.
Keywords
- electro-optical devices
- emittance control
- infrared materials
- metasurfaces
- plasmonics
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics