Overcoming material challenges for replication of Motheye Lenses using step and flash imprint lithography (S-FIL) for opto-electronic applications

J Kettle; RT Hoyle; RM Perks; Stefan Dimov

Overcoming material challenges for replication of Motheye Lenses using step and flash imprint lithography (S-FIL) for opto-electronic applications

J Kettle, RT Hoyle, RM Perks, Stefan Dimov

Mechanical Engineering

Research output: Contribution to journal › Article › peer-review

Original language	English
Journal	Journal of Vacuum Science and Technology. Part B. Nanotechnology & Microelectronics
Publication status	Published - 1 Jan 2008

Cite this

@article{0ac3a78feca241e7948774c75bc34af1,

title = "Overcoming material challenges for replication of Motheye Lenses using step and flash imprint lithography (S-FIL) for opto-electronic applications",

author = "J Kettle and RT Hoyle and RM Perks and Stefan Dimov",

year = "2008",

month = jan,

day = "1",

language = "English",

journal = "Journal of Vacuum Science and Technology. Part B. Nanotechnology & Microelectronics",

issn = "0734-211X",

publisher = "American Institute of Physics",

}

TY - JOUR

T1 - Overcoming material challenges for replication of Motheye Lenses using step and flash imprint lithography (S-FIL) for opto-electronic applications

AU - Kettle, J

AU - Hoyle, RT

AU - Perks, RM

AU - Dimov, Stefan

PY - 2008/1/1

Y1 - 2008/1/1

M3 - Article

SN - 0734-211X

JO - Journal of Vacuum Science and Technology. Part B. Nanotechnology & Microelectronics

JF - Journal of Vacuum Science and Technology. Part B. Nanotechnology & Microelectronics

ER -