Fabrication of Step-and-Flash imprint lithography (S-FIL) templates using XeF2 enhanced focused Ion Beam Etching

J Kettle, RT Hoyle, Stefan Dimov

Research output: Contribution to journal › Article › peer-review

Cite this

@article{757f38f1b0664d43a55a8f997a4dacfb,

title = "Fabrication of Step-and-Flash imprint lithography (S-FIL) templates using XeF2 enhanced focused Ion Beam Etching",

author = "J Kettle and RT Hoyle and Stefan Dimov",

year = "2009",

month = jan,

day = "1",

language = "English",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics",

}