Effect of wavefront aberrations on a focused plenoptic imaging system: a wave optics simulation approach

Massimo Turola, Christopher Meah, Richard J. Marshall, Iain B. Styles, Steve Gruppetta

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Abstract

A plenoptic imaging system records simultaneously the intensity and the direction of the rays of light. This additional information allows many post processing features such as 3D imaging, synthetic refocusing and potentially evaluation of wavefront aberrations. In this paper the effects of low order aberrations on a simple plenoptic imaging system have been investigated using a wave optics simulations approach.
Original languageEnglish
Title of host publicationProceedings of the SPIE
Subtitle of host publicationModeling Aspects in Optical Metrology V
EditorsBernd Bodermann, Karsten Frenner, Richard Silver
PublisherSociety of Photo-Optical Instrumentation Engineers
Pages95260X-95260X-8
Volume9526
ISBN (Print)9781628416862
DOIs
Publication statusPublished - 2015
EventModeling Aspects in Optical Metrology V - Munich, Germany
Duration: 23 Jun 201525 Jun 2015

Publication series

NameProceedings of SPIE
Volume9526
ISSN (Print)0277-786X

Conference

ConferenceModeling Aspects in Optical Metrology V
Country/TerritoryGermany
CityMunich
Period23/06/1525/06/15

Keywords

  • Imaging systems
  • Optics
  • Simulations
  • Wavefront aberrations
  • Stereoscopy

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