Abstract
Oblique incidence on a stack of subwavelength hole arrays wafers is analyzed both from simulation and measurement. A strong anisotropic behaviour is observed giving as a result that for P-polarized illumination, the refracted beam emerges at negative angles whereas for S-polarized illumination it is at positive angles. Two-dimensional dispersion diagrams are calculated to predict qualitatively the performance of the structure in terms of the refraction, which is subsequently demonstrated with experiments in the millimetre-wave range.
| Original language | English |
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| Title of host publication | EuCAP 2010 - The 4th European Conference on Antennas and Propagation |
| Publication status | Published - 2010 |
| Event | 4th European Conference on Antennas and Propagation, EuCAP 2010 - Barcelona, Spain Duration: 12 Apr 2010 → 16 Apr 2010 |
Conference
| Conference | 4th European Conference on Antennas and Propagation, EuCAP 2010 |
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| Country/Territory | Spain |
| City | Barcelona |
| Period | 12/04/10 → 16/04/10 |
ASJC Scopus subject areas
- Computer Networks and Communications
- Electrical and Electronic Engineering