Ultrathin fullerene films as high-resolution molecular resists for low-voltage electron-beam lithography

Research output: Contribution to journalArticle

Details

Original languageEnglish
Pages (from-to)1003-1006
Number of pages4
JournalSmall
Volume2
Issue number8-9
Publication statusPublished - 1 Aug 2006

Keywords

  • fullerenes, lithography, thin films, electron beams, resists