Ultrathin fullerene films as high-resolution molecular resists for low-voltage electron-beam lithography

Francis Gibbons, Alexander Robinson, Richard Palmer, Mayandithevar Manickam, Jon Preece

Research output: Contribution to journalArticle

21 Citations (Scopus)
Original languageEnglish
Pages (from-to)1003-1006
Number of pages4
JournalSmall
Volume2
Issue number8-9
DOIs
Publication statusPublished - 1 Aug 2006

Keywords

  • fullerenes
  • lithography
  • thin films
  • electron beams
  • resists

Cite this