Time-resolved gas-phase kinetic, quantum chemical, and RRKM studies of the reaction of silylene with 2,5-dihydrofuran

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Authors

Colleges, School and Institutes

External organisations

  • Dow Corning Corporation, 2200 West Salzburg Road, Midland, Michigan 48641, United States
  • Instituto de Quimica-Fisica Rocasolano, CSIC, Calle Serrano 119, 28006 Madrid, Spain
  • University of Reading

Abstract

Time-resolved kinetics studies of silylene, SiH2, generated by laser flash photolysis of phenylsilane, were performed to obtain rate coefficients for its bimolecular reaction with 2,5-dihydrofuran (2,5-DHF). The reaction was studied in the gas phase over the pressure range of 1–100 Torr in SF6 bath gas, at five temperatures in the range of 296–598 K. The reaction showed pressure dependences characteristic of a third body assisted association. The second-order rate coefficients obtained by Rice–Ramsperger–Kassel–Marcus (RRKM)-assisted extrapolation to the high-pressure limit at each temperature fitted the following Arrhenius equation where the error limits are single standard deviations: log(k/cm3 molecule–1 s–1) = (−9.96 ± 0.08) + (3.38 ± 0.62 kJ mol–1)/RT ln 10. End-product analysis revealed no GC-identifiable product. Quantum chemical (ab initio) calculations indicate that reaction of SiH2 with 2,5-DHF can occur at both the double bond (to form a silirane) and the O atom (to form a donor–acceptor, zwitterionic complex) via barrierless processes. Further possible reaction steps were explored, of which the only viable one appears to be decomposition of the O-complex to give 1,3-butadiene + silanone, although isomerization of the silirane cannot be completely ruled out. The potential energy surface for SiH2 + 2,5-DHF is consistent with that of SiH2 with Me2O, and with that of SiH2 with cis-but-2-ene, the simplest reference reactions. RRKM calculations incorporating reaction at both π- and O atom sites, can be made to fit the experimental rate coefficient pressure dependence curves at 296–476 K, giving values for k(π) and k(O) that indicate the latter is larger in magnitude at all temperatures, in contrast to values from individual model reactions. This unexpected result suggests that, in 2,5-DHF with its two different reaction sites, the O atom exerts the more pronounced electrophilic attraction on the approaching silylene. Arrhenius parameters for the individual pathways were obtained. The lack of a fit at 598 K is consistent with decomposition of the O-complex to give 1,3-butadiene + silanone.

Details

Original languageEnglish
Pages (from-to)11241–11253
Number of pages13
JournalThe Journal of Physical Chemistry A
Volume119
Issue number46
Early online date5 Nov 2015
Publication statusPublished - 19 Nov 2015