Thin film LaYbO3 capacitive structures grown by pulsed laser deposition

Research output: Contribution to journalArticlepeer-review

Authors

  • G. Vasta
  • D.I. Woodward
  • D. Walker
  • P.A. Thomas

External organisations

  • Department of Experimental Physics
  • THE UNIVERSITY OF WARWICK

Abstract

The crystal structure and the dielectric properties of LaYbO3 films grown by pulsed laser deposition and integrated in SrRuO3/LaYbO3/SrRuO3 capacitive structures are reported. Two different fabrication procedures are assessed. When the SrRuO3/LaYbO3/SrRuO3 stack is grown in-situ, the relative permittivity of the LaYbO3 is 35. When instead the lower SrRuO3 electrode layer is patterned by contact photolithography and argon ion milling, prior to the deposition of the LaYbO3, the relative permittivity of the LaYbO3 is 55. In this case, post-growth annealing brings the relative permittivity towards that of the film grown in-situ. In both cases the relative permittivity is higher than the value measured in bulk material. This is attributed to the permittivity being highest along the orthorhombic c-axis. The annealing procedure produced a recrystallization of the LaYbO3 and of the SrRuO3.

Details

Original languageEnglish
Pages (from-to)81-86
Number of pages6
JournalThin Solid Films
Volume527
Publication statusPublished - 1 Jan 2013

Keywords

  • Lanthanide ytterbium oxide, Thin films, Dielectric properties, Crystal structure, Pulsed Laser Deposition