Submillimetre rectangular waveguides based on SU-8 photoresist micromachining technology

David Glynn, Tianhao He, Jeffrey Powell, Yingtao Tian, Xiaobang Shang, Michael J. Lancaster

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

Abstract

Rectangular waveguides are fundamental structures for the transmission of signals at millimetre and submillimetre wavelengths. This paper describes the design and measured results for two rectangular waveguides based on layered SU-8 photoresist micromachining technology, with double-layer fabrication techniques to minimise the air gaps between layers. A brief description of the SU-8 photoresist micromachining procedure is given in the paper. One waveguide is demonstrated for the WR-3 band from 220 GHz to 325 GHz the other is for the WR-6 band 120 GHz to 170 GHz both are made of layered SU-8 with a 3 piece construction. Both waveguides have novel bends in order to connect to the measurement apparatus. The measured performance is presented and compared to conventional machined metal waveguide structures. The measured insertion loss for the SU-8 waveguides in both bands is better than 0.03 dB/mm.
Original languageEnglish
Title of host publicationEuropean Microwave Week 2016 Conference Proceedings
PublisherInstitute of Electrical and Electronics Engineers (IEEE)
Pages1346-1349
ISBN (Print)978-2-87487-042-2
DOIs
Publication statusPublished - Feb 2017
Event2016 46th European Microwave Conference (EuMC) - London, United Kingdom
Duration: 4 Oct 20166 Oct 2016

Conference

Conference2016 46th European Microwave Conference (EuMC)
Period4/10/166/10/16

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