Recent developments in the fabrication of ordered nanostructure arrays based on nanosphere lithography.

Research output: Contribution to journalReview article


Colleges, School and Institutes


Since it was invented two decades ago, Nanosphere Lithography (NSL) has been widely studied as a low cost and flexible technique to fabricate nanostructures. Based on the registered patents and some selected papers, this review will discuss recent developments of different NSL strategies for the fabrication of ordered nanostructure arrays. The mechanism of self-assembly process and the techniques for preparing the self-assembled nanosphere template are first briefly introduced. The nanosphere templates are used either as shadow masks or as moulds for pattern transfer. Much more work now combines NSL with other lithographic techniques and material growth methods to form novel nanostructures of complex shape or various materials. Hence, this review finally gives a discussion on some future directions in NSL study.


Original languageEnglish
Pages (from-to)194-204
Number of pages11
JournalRecent patents on nanotechnology
Issue number3
Publication statusPublished - 1 Nov 2010