Original language | English |
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Article number | 79722N |
Journal | Proceedings of SPIE - The International Society for Optical Engineering |
Volume | 7972 |
DOIs | |
Publication status | Published - 15 Apr 2011 |
Plasma Etching of High-resolution Features in a Fullerene Molecular Resist
Jedsada Manyam, Mayandithevar Manickam, Jon Preece, Richard Palmer, Alexander Robinson
Research output: Contribution to journal › Abstract
21
Citations
(Scopus)