Plasma Etching of High-resolution Features in a Fullerene Molecular Resist

Research output: Contribution to conference (unpublished)Paper

Standard

Plasma Etching of High-resolution Features in a Fullerene Molecular Resist. / Manyam, Jedsada; Manickam, Mayandithevar; Preece, Jon; Palmer, Richard; Robinson, Alexander.

2011. Paper presented at SPIE Proceedings: Advances in Resist Materials and Processing Technology XXVIII, San Jose, California, United States.

Research output: Contribution to conference (unpublished)Paper

Harvard

Manyam, J, Manickam, M, Preece, J, Palmer, R & Robinson, A 2011, 'Plasma Etching of High-resolution Features in a Fullerene Molecular Resist', Paper presented at SPIE Proceedings: Advances in Resist Materials and Processing Technology XXVIII, San Jose, California, United States, 27/02/11.

APA

Manyam, J., Manickam, M., Preece, J., Palmer, R., & Robinson, A. (2011). Plasma Etching of High-resolution Features in a Fullerene Molecular Resist. Paper presented at SPIE Proceedings: Advances in Resist Materials and Processing Technology XXVIII, San Jose, California, United States.

Vancouver

Manyam J, Manickam M, Preece J, Palmer R, Robinson A. Plasma Etching of High-resolution Features in a Fullerene Molecular Resist. 2011. Paper presented at SPIE Proceedings: Advances in Resist Materials and Processing Technology XXVIII, San Jose, California, United States.

Author

Manyam, Jedsada ; Manickam, Mayandithevar ; Preece, Jon ; Palmer, Richard ; Robinson, Alexander. / Plasma Etching of High-resolution Features in a Fullerene Molecular Resist. Paper presented at SPIE Proceedings: Advances in Resist Materials and Processing Technology XXVIII, San Jose, California, United States.

Bibtex

@conference{5b3b25bafea24e95a950ff44debd7f35,
title = "Plasma Etching of High-resolution Features in a Fullerene Molecular Resist",
keywords = "Silicon, Electron Beam Lithography, Fullerene, ICP Etching, Molecular Resist, Chemically Amplified Resist",
author = "Jedsada Manyam and Mayandithevar Manickam and Jon Preece and Richard Palmer and Alexander Robinson",
year = "2011",
month = feb,
day = "27",
language = "English",
note = "SPIE Proceedings: Advances in Resist Materials and Processing Technology XXVIII ; Conference date: 27-02-2011",

}

RIS

TY - CONF

T1 - Plasma Etching of High-resolution Features in a Fullerene Molecular Resist

AU - Manyam, Jedsada

AU - Manickam, Mayandithevar

AU - Preece, Jon

AU - Palmer, Richard

AU - Robinson, Alexander

PY - 2011/2/27

Y1 - 2011/2/27

KW - Silicon

KW - Electron Beam Lithography

KW - Fullerene

KW - ICP Etching

KW - Molecular Resist

KW - Chemically Amplified Resist

M3 - Paper

T2 - SPIE Proceedings: Advances in Resist Materials and Processing Technology XXVIII

Y2 - 27 February 2011

ER -