@conference{5b3b25bafea24e95a950ff44debd7f35,
title = "Plasma Etching of High-resolution Features in a Fullerene Molecular Resist",
keywords = "Silicon, Electron Beam Lithography, Fullerene, ICP Etching, Molecular Resist, Chemically Amplified Resist",
author = "Jedsada Manyam and Mayandithevar Manickam and Jon Preece and Richard Palmer and Alexander Robinson",
year = "2011",
month = feb,
day = "27",
language = "English",
note = "SPIE Proceedings: Advances in Resist Materials and Processing Technology XXVIII ; Conference date: 27-02-2011",
}