Plasma Etching of High-resolution Features in a Fullerene Molecular Resist

Research output: Contribution to conference (unpublished)Paper

Details

Original languageEnglish
Publication statusPublished - 27 Feb 2011
EventSPIE Proceedings: Advances in Resist Materials and Processing Technology XXVIII - San Jose, California, United States
Duration: 27 Feb 2011 → …

Conference

ConferenceSPIE Proceedings: Advances in Resist Materials and Processing Technology XXVIII
CountryUnited States
CitySan Jose, California
Period27/02/11 → …

Keywords

  • Silicon, Electron Beam Lithography, Fullerene, ICP Etching, Molecular Resist, Chemically Amplified Resist