Plasma Etching of High-resolution Features in a Fullerene Molecular Resist

Jedsada Manyam, Mayandithevar Manickam, Jon Preece, Richard Palmer, Alexander Robinson

Research output: Contribution to conference (unpublished)Paper

Original languageEnglish
Publication statusPublished - 27 Feb 2011
EventSPIE Proceedings: Advances in Resist Materials and Processing Technology XXVIII - San Jose, California, United States
Duration: 27 Feb 2011 → …

Conference

ConferenceSPIE Proceedings: Advances in Resist Materials and Processing Technology XXVIII
Country/TerritoryUnited States
CitySan Jose, California
Period27/02/11 → …

Keywords

  • Silicon
  • Electron Beam Lithography
  • Fullerene
  • ICP Etching
  • Molecular Resist
  • Chemically Amplified Resist

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