Plasma etching of high-resolution features in a fullerene molecular resist

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Standard

Plasma etching of high-resolution features in a fullerene molecular resist. / Manyam, J.; Manickam, M.; Preece, J.A.; Palmer, R.E.; Robinson, A.P.G.

Proceedings of SPIE - The International Society for Optical Engineering. 2011.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Harvard

APA

Vancouver

Author

Manyam, J. ; Manickam, M. ; Preece, J.A. ; Palmer, R.E. ; Robinson, A.P.G. / Plasma etching of high-resolution features in a fullerene molecular resist. Proceedings of SPIE - The International Society for Optical Engineering. 2011.

Bibtex

@inproceedings{32284346c3c0474ebd4f4a3e805c9f18,
title = "Plasma etching of high-resolution features in a fullerene molecular resist",
author = "J. Manyam and M. Manickam and J.A. Preece and R.E. Palmer and A.P.G. Robinson",
year = "2011",
doi = "10.1117/12.879469",
language = "Undefined/Unknown",
isbn = "0277786X",
booktitle = "Proceedings of SPIE - The International Society for Optical Engineering",

}

RIS

TY - GEN

T1 - Plasma etching of high-resolution features in a fullerene molecular resist

AU - Manyam, J.

AU - Manickam, M.

AU - Preece, J.A.

AU - Palmer, R.E.

AU - Robinson, A.P.G.

PY - 2011

Y1 - 2011

UR - http://www.scopus.com/inward/record.url?eid=2-s2.0-79955879112&partnerID=MN8TOARS

U2 - 10.1117/12.879469

DO - 10.1117/12.879469

M3 - Conference contribution

SN - 0277786X

BT - Proceedings of SPIE - The International Society for Optical Engineering

ER -