Patterned deposition from compressed carbon dioxide

Research output: Contribution to journalConference articlepeer-review

Colleges, School and Institutes

External organisations

  • University of Cambridge
  • Supercritical Fluid Technology Group

Abstract

Compressed CO2 is employed as the solvent for the deposition of polymers onto patterned surfaces created by a lithographic technique. This deposition technique should have wide applicability in the deposition of organic and polymeric materials for optoelectronic devices. The advantage of controlled deposition confers a further benefit in the control of the patterned surface. In a specific example a perfluorinated polymer was dissolved in liquid carbon dioxide. The polymer solution was deposited by use of a nozzle onto a pre-patterned surface. The resulting polymer film showed a clear image of the original pattern as measured by optical microscopy.

Details

Original languageEnglish
Pages (from-to)103-108
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume734
Publication statusPublished - 30 Jun 2003
EventPolymer/Metal Interfaces and Defect Mediated Phenomena in Ordered Polymers - Boston, MA, United States
Duration: 2 Dec 20026 Dec 2002