Patterned deposition from compressed carbon dioxide
Research output: Contribution to journal › Conference article › peer-review
Authors
Colleges, School and Institutes
External organisations
- University of Cambridge
- Supercritical Fluid Technology Group
Abstract
Compressed CO2 is employed as the solvent for the deposition of polymers onto patterned surfaces created by a lithographic technique. This deposition technique should have wide applicability in the deposition of organic and polymeric materials for optoelectronic devices. The advantage of controlled deposition confers a further benefit in the control of the patterned surface. In a specific example a perfluorinated polymer was dissolved in liquid carbon dioxide. The polymer solution was deposited by use of a nozzle onto a pre-patterned surface. The resulting polymer film showed a clear image of the original pattern as measured by optical microscopy.
Details
Original language | English |
---|---|
Pages (from-to) | 103-108 |
Number of pages | 6 |
Journal | Materials Research Society Symposium - Proceedings |
Volume | 734 |
Publication status | Published - 30 Jun 2003 |
Event | Polymer/Metal Interfaces and Defect Mediated Phenomena in Ordered Polymers - Boston, MA, United States Duration: 2 Dec 2002 → 6 Dec 2002 |