Patterned deposition from compressed carbon dioxide

C. K. Luscombe*, W. T S Huck, A. B. Holmes, T. Lu, G. A. Leeke, R. C D Santos, B. Al-Duri, J. P K Seville

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Compressed CO2 is employed as the solvent for the deposition of polymers onto patterned surfaces created by a lithographic technique. This deposition technique should have wide applicability in the deposition of organic and polymeric materials for optoelectronic devices. The advantage of controlled deposition confers a further benefit in the control of the patterned surface. In a specific example a perfluorinated polymer was dissolved in liquid carbon dioxide. The polymer solution was deposited by use of a nozzle onto a pre-patterned surface. The resulting polymer film showed a clear image of the original pattern as measured by optical microscopy.

Original languageEnglish
Title of host publicationMolecular Electronics
Pages1-6
Number of pages6
Volume761
Publication statusPublished - 1 Dec 2002
Event2002 MRS Fall Meeting - Boston, MA, United States
Duration: 2 Dec 20026 Dec 2002

Conference

Conference2002 MRS Fall Meeting
Country/TerritoryUnited States
CityBoston, MA
Period2/12/026/12/02

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

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