Patterned deposition from compressed carbon dioxide

Research output: Chapter in Book/Report/Conference proceedingConference contribution


  • C. K. Luscombe
  • W. T S Huck
  • A. B. Holmes
  • G. A. Leeke
  • B. Al-Duri

Colleges, School and Institutes

External organisations

  • University of Cambridge
  • Supercritical Fluid Technology Group
  • University of Birmingham


Compressed CO2 is employed as the solvent for the deposition of polymers onto patterned surfaces created by a lithographic technique. This deposition technique should have wide applicability in the deposition of organic and polymeric materials for optoelectronic devices. The advantage of controlled deposition confers a further benefit in the control of the patterned surface. In a specific example a perfluorinated polymer was dissolved in liquid carbon dioxide. The polymer solution was deposited by use of a nozzle onto a pre-patterned surface. The resulting polymer film showed a clear image of the original pattern as measured by optical microscopy.


Original languageEnglish
Title of host publicationMolecular Electronics
Publication statusPublished - 1 Dec 2002
Event2002 MRS Fall Meeting - Boston, MA, United States
Duration: 2 Dec 20026 Dec 2002


Conference2002 MRS Fall Meeting
Country/TerritoryUnited States
CityBoston, MA