Organic hard masks utilizing fullerene derivatives

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Standard

Organic hard masks utilizing fullerene derivatives. / Palmer, Richard; Frommhold, Andreas; Robinson, Alexander; Brown, Alan; Lada, Tom.

Organic hard masks utilizing fullerene derivatives. 2015.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Harvard

Palmer, R, Frommhold, A, Robinson, A, Brown, A & Lada, T 2015, Organic hard masks utilizing fullerene derivatives. in Organic hard masks utilizing fullerene derivatives. https://doi.org/10.1117/12.2085675

APA

Palmer, R., Frommhold, A., Robinson, A., Brown, A., & Lada, T. (2015). Organic hard masks utilizing fullerene derivatives. In Organic hard masks utilizing fullerene derivatives https://doi.org/10.1117/12.2085675

Vancouver

Palmer R, Frommhold A, Robinson A, Brown A, Lada T. Organic hard masks utilizing fullerene derivatives. In Organic hard masks utilizing fullerene derivatives. 2015 https://doi.org/10.1117/12.2085675

Author

Palmer, Richard ; Frommhold, Andreas ; Robinson, Alexander ; Brown, Alan ; Lada, Tom. / Organic hard masks utilizing fullerene derivatives. Organic hard masks utilizing fullerene derivatives. 2015.

Bibtex

@inproceedings{d1d7fd9da06b45f386d93447c4d27178,
title = "Organic hard masks utilizing fullerene derivatives",
abstract = "We have developed a series of fullerene containing materials for use as organic hard masks. Films with a thickness of up to 250 nm were deposited via spin coating. After a crosslinking bake the films exhibit good thermal stability – in the best case a mass loss of less than 3% at 400 °C is seen. Etch resistance of the different formulations are presented and hig-hresolution patterning is demonstrated. During the transfer into silicon no adverse “wiggling” is observed at high resolution. We attribute this to the low levels of aliphatic hydrogen present in the materials. {\textcopyright} (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.",
author = "Richard Palmer and Andreas Frommhold and Alexander Robinson and Alan Brown and Tom Lada",
year = "2015",
month = mar,
day = "20",
doi = "10.1117/12.2085675",
language = "English",
booktitle = "Organic hard masks utilizing fullerene derivatives",

}

RIS

TY - GEN

T1 - Organic hard masks utilizing fullerene derivatives

AU - Palmer, Richard

AU - Frommhold, Andreas

AU - Robinson, Alexander

AU - Brown, Alan

AU - Lada, Tom

PY - 2015/3/20

Y1 - 2015/3/20

N2 - We have developed a series of fullerene containing materials for use as organic hard masks. Films with a thickness of up to 250 nm were deposited via spin coating. After a crosslinking bake the films exhibit good thermal stability – in the best case a mass loss of less than 3% at 400 °C is seen. Etch resistance of the different formulations are presented and hig-hresolution patterning is demonstrated. During the transfer into silicon no adverse “wiggling” is observed at high resolution. We attribute this to the low levels of aliphatic hydrogen present in the materials. © (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.

AB - We have developed a series of fullerene containing materials for use as organic hard masks. Films with a thickness of up to 250 nm were deposited via spin coating. After a crosslinking bake the films exhibit good thermal stability – in the best case a mass loss of less than 3% at 400 °C is seen. Etch resistance of the different formulations are presented and hig-hresolution patterning is demonstrated. During the transfer into silicon no adverse “wiggling” is observed at high resolution. We attribute this to the low levels of aliphatic hydrogen present in the materials. © (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.

U2 - 10.1117/12.2085675

DO - 10.1117/12.2085675

M3 - Conference contribution

BT - Organic hard masks utilizing fullerene derivatives

ER -