Non-local atomic manipulation on semiconductor surfaces in the STM: the case of chlorobenzene on Si(111)-7×7

Research output: Contribution to journalArticlepeer-review

Standard

Non-local atomic manipulation on semiconductor surfaces in the STM : the case of chlorobenzene on Si(111)-7×7. / Pan, Tianluo; Sloan, Peter A; Palmer, Richard E.

In: The Chemical Record, Vol. 14, No. 5, 06.08.2014, p. 841-847.

Research output: Contribution to journalArticlepeer-review

Harvard

APA

Vancouver

Author

Bibtex

@article{7725cbdea2f945a896a2a494109db50b,
title = "Non-local atomic manipulation on semiconductor surfaces in the STM: the case of chlorobenzene on Si(111)-7×7",
abstract = "Control over individual atoms with the scanning tunnelling microscope (STM) holds the tantalising prospect of atomic-scale construction, but is limited by its {"}one atom at a time{"} serial nature. {"}Remote control{"} through non-local STM manipulation-as we have demonstrated in the case of chlorobenzene on Si(111)-7×7-offers a new avenue for future {"}bottom-up{"} nanofabrication, since hundreds of chemical reactions may be carried out in parallel. Thus a good understanding of the non-local manipulation process, as provided by recent experiments, is important. Comparison of scanning tunnelling spectroscopy (STS) measurements of the bare Si(111)-7×7 surface and chemisorbed chlorobenzene molecules with the voltage dependence of the non-local STM-induced desorption of chlorobenzene proves particularly instructive. For example, the chlorobenzene LUMO appears at +0.9 V with respect to the Fermi level, whereas non-local manipulation thresholds are found at +2.1 V and +2.7 V. This difference supports a picture in which the voltage thresholds for non-local electron-induced desorption depend principally on the energies of the electronic states of the surface. Furthermore, the demonstration that the non-local process is largely insensitive to surface steps up to five layers in height suggests that either the electron transport in this process is subsurface in character or surface charge transport is responsible but is in some way unaffected by the steps.",
keywords = "Chlorobenzenes, Microscopy, Scanning Tunneling, Semiconductors, Silicon, Surface Properties, desorption, non‐local manipulation, scanning probe microscopy, surface analysis, surface chemistry",
author = "Tianluo Pan and Sloan, {Peter A} and Palmer, {Richard E}",
note = "Copyright {\textcopyright} 2014 The Chemical Society of Japan and Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim.",
year = "2014",
month = aug,
day = "6",
doi = "10.1002/tcr.201402021",
language = "English",
volume = "14",
pages = "841--847",
journal = "The Chemical Record",
issn = "1527-8999",
publisher = "Chemical Society of Japan",
number = "5",

}

RIS

TY - JOUR

T1 - Non-local atomic manipulation on semiconductor surfaces in the STM

T2 - the case of chlorobenzene on Si(111)-7×7

AU - Pan, Tianluo

AU - Sloan, Peter A

AU - Palmer, Richard E

N1 - Copyright © 2014 The Chemical Society of Japan and Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim.

PY - 2014/8/6

Y1 - 2014/8/6

N2 - Control over individual atoms with the scanning tunnelling microscope (STM) holds the tantalising prospect of atomic-scale construction, but is limited by its "one atom at a time" serial nature. "Remote control" through non-local STM manipulation-as we have demonstrated in the case of chlorobenzene on Si(111)-7×7-offers a new avenue for future "bottom-up" nanofabrication, since hundreds of chemical reactions may be carried out in parallel. Thus a good understanding of the non-local manipulation process, as provided by recent experiments, is important. Comparison of scanning tunnelling spectroscopy (STS) measurements of the bare Si(111)-7×7 surface and chemisorbed chlorobenzene molecules with the voltage dependence of the non-local STM-induced desorption of chlorobenzene proves particularly instructive. For example, the chlorobenzene LUMO appears at +0.9 V with respect to the Fermi level, whereas non-local manipulation thresholds are found at +2.1 V and +2.7 V. This difference supports a picture in which the voltage thresholds for non-local electron-induced desorption depend principally on the energies of the electronic states of the surface. Furthermore, the demonstration that the non-local process is largely insensitive to surface steps up to five layers in height suggests that either the electron transport in this process is subsurface in character or surface charge transport is responsible but is in some way unaffected by the steps.

AB - Control over individual atoms with the scanning tunnelling microscope (STM) holds the tantalising prospect of atomic-scale construction, but is limited by its "one atom at a time" serial nature. "Remote control" through non-local STM manipulation-as we have demonstrated in the case of chlorobenzene on Si(111)-7×7-offers a new avenue for future "bottom-up" nanofabrication, since hundreds of chemical reactions may be carried out in parallel. Thus a good understanding of the non-local manipulation process, as provided by recent experiments, is important. Comparison of scanning tunnelling spectroscopy (STS) measurements of the bare Si(111)-7×7 surface and chemisorbed chlorobenzene molecules with the voltage dependence of the non-local STM-induced desorption of chlorobenzene proves particularly instructive. For example, the chlorobenzene LUMO appears at +0.9 V with respect to the Fermi level, whereas non-local manipulation thresholds are found at +2.1 V and +2.7 V. This difference supports a picture in which the voltage thresholds for non-local electron-induced desorption depend principally on the energies of the electronic states of the surface. Furthermore, the demonstration that the non-local process is largely insensitive to surface steps up to five layers in height suggests that either the electron transport in this process is subsurface in character or surface charge transport is responsible but is in some way unaffected by the steps.

KW - Chlorobenzenes

KW - Microscopy, Scanning Tunneling

KW - Semiconductors

KW - Silicon

KW - Surface Properties

KW - desorption

KW - non‐local manipulation

KW - scanning probe microscopy

KW - surface analysis

KW - surface chemistry

U2 - 10.1002/tcr.201402021

DO - 10.1002/tcr.201402021

M3 - Article

C2 - 25130501

VL - 14

SP - 841

EP - 847

JO - The Chemical Record

JF - The Chemical Record

SN - 1527-8999

IS - 5

ER -