Methanofullerenes

Alex Robinson; Jon Preece; Richard Palmer; Andreas Frommhold; Dongxu Yang; Alexandra McClelland; Drew Athens; Xiang Xu

Methanofullerenes

Alex Robinson (Inventor), Jon Preece (Inventor), Richard Palmer (Inventor), Andreas Frommhold (Inventor), Dongxu Yang (Inventor), Alexandra McClelland (Inventor), Drew Athens (Inventor), Xiang Xu (Inventor)

Research output: Patent

Abstract

The present disclosure relates to novel methanofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.

Original language	English
Patent number	9256126
Publication status	Published - 9 Feb 2016

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title = "Methanofullerenes",

abstract = "The present disclosure relates to novel methanofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.",

author = "Alex Robinson and Jon Preece and Richard Palmer and Andreas Frommhold and Dongxu Yang and Alexandra McClelland and Drew Athens and Xiang Xu",

year = "2016",

month = feb,

day = "9",

language = "English",

type = "Patent",

note = "9256126",

}

TY - PAT

T1 - Methanofullerenes

AU - Robinson, Alex

AU - Preece, Jon

AU - Palmer, Richard

AU - Frommhold, Andreas

AU - Yang, Dongxu

AU - McClelland, Alexandra

AU - Athens, Drew

AU - Xu, Xiang

PY - 2016/2/9

Y1 - 2016/2/9

N2 - The present disclosure relates to novel methanofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.

AB - The present disclosure relates to novel methanofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.

M3 - Patent

M1 - 9256126

ER -

Methanofullerenes

Abstract

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