Methanofullerenes

Research output: Patent

Authors

  • A.P.G. Robinson (Inventor)
  • Dongxu Yang (Inventor)
  • Alexandra McClelland (Inventor)
  • Drew Athens (Inventor)
  • Xiang Xue (Inventor)

Colleges, School and Institutes

External organisations

  • School of Chemical EngineeringUniversity of BirminghamEdgbastonB15 2TTUnited Kingdom
  • IRRESISTIBLE MATERIALS LTD

Abstract

The present disclosure relates to novel methofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays. Negative photosensitive compositions are also disclosed.

Details

Original languageEnglish
Patent number9323149
Publication statusPublished - 26 Apr 2016