Research output: Patent
- School of Chemical EngineeringUniversity of BirminghamEdgbastonB15 2TTUnited Kingdom
- IRRESISTIBLE MATERIALS LTD
The present disclosure relates to novel methofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays. Negative photosensitive compositions are also disclosed.
|Publication status||Published - 26 Apr 2016|