Abstract
In this paper two calibrated measurement methods for submillimeter circuits are presented and micromachined waveguides operating between 220 and 325 GHz have been fabricated using thick SU-8 photoresist technology and tested. The first measurement method is achieved by employing a pair of micromachined embedded H-plane bends, which were specially designed to enable direct and accurate connection between the micromachined circuit and standard waveguide flanges. A 16 mm long WR-3 waveguide has been designed, fabricated and measured using this technology. The measured average insertion loss is 2.3 dB or 0.144 dB/mm over the frequency range of 220 - 321 GHz. The second measurement technology employs a conventionally machined metal block constructed with two separate pieces in which to mount the micromachined circuit. A choke flange has been adopted for eliminating the effect of air gap at the interfaces between the micromachined circuit and metal block. A 15 mm long WR-3 straight waveguide has been fabricated and tested. The measured insertion loss is between 1.4 dB and 3.2 dB corresponding to 0.093 and 0.213 dB/mm. A comparison between these two measurement technologies has been carried out and presented.
Original language | English |
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Title of host publication | 76th ARFTG Microwave Measurement Conference |
Subtitle of host publication | Millimeter-Wave Measurements and Modeling, ARFTG 2010 |
DOIs | |
Publication status | Published - 1 Dec 2010 |
Event | 76th ARFTG Microwave Measurement Conference: Millimeter-Wave Measurements and Modeling, ARFTG 2010 - Clearwater Beach, FL, United States Duration: 30 Nov 2010 → 3 Dec 2010 |
Conference
Conference | 76th ARFTG Microwave Measurement Conference: Millimeter-Wave Measurements and Modeling, ARFTG 2010 |
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Country/Territory | United States |
City | Clearwater Beach, FL |
Period | 30/11/10 → 3/12/10 |
Keywords
- Micromachining
- Microwave measurement
- Submillimeter wave devices
- WR-3 waveguide
ASJC Scopus subject areas
- Computer Networks and Communications