Lamellar orientation of block copolymer using polarity switch of Nitrophenyl self-assembled monolayer (SAM) induced by electron beam.

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@article{09ebd49c7a16402ba11f98b93b30045e,
title = "Lamellar orientation of block copolymer using polarity switch of Nitrophenyl self-assembled monolayer (SAM) induced by electron beam.",
abstract = "Directed self-assembly (DSA) was investigated on self-assembled monolayers (SAMs) of 6-(4-nitrophenoxy) hexane-1-thiol (NPHT), which were chemically modified by electron beam (EB) irradiation. By irradiating a responsive interfacial surface, the orientation and selective patterning of block copolymer domains could be achieved. We demonstrated that spatially-selective lamellar orientation of polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) could be induced via modification of an underlying SAM; for instance the conversion of an NO2 group to an NH2 group, induced by EB. The lamellar orientation of PS-b-PMMA was controlled by the change in the polarity of different regions of the SAM using EB lithography. The reductive treatment of SAM substrates plays a crucial role in the orientation of block copolymer. This method might greatly simplify block copolymer DSA processes as compared to the conventional multi-step chemo-epitaxy DSA process. By examining the lamellae orientation by EB, we found that the vertical orientation persists only for appropriate an irradiation dose and annealing temperature.",
keywords = "Block copolymer , electron beam, polarity switch, self-assembled monolayer, lamellar orientation",
author = "Hiroki Yamamoto and Guy Dawson and Takahiro Kozawa and Alexander Robinson",
year = "2017",
month = may,
day = "18",
doi = "10.1117/12.2257953",
language = "English",
volume = "10146",
journal = "Proceedings of SPIE - The International Society for Optical Engineering",
issn = "0277-786X",
publisher = "Society of Photo-Optical Instrumentation Engineers",

}

RIS

TY - JOUR

T1 - Lamellar orientation of block copolymer using polarity switch of Nitrophenyl self-assembled monolayer (SAM) induced by electron beam.

AU - Yamamoto, Hiroki

AU - Dawson, Guy

AU - Kozawa, Takahiro

AU - Robinson, Alexander

PY - 2017/5/18

Y1 - 2017/5/18

N2 - Directed self-assembly (DSA) was investigated on self-assembled monolayers (SAMs) of 6-(4-nitrophenoxy) hexane-1-thiol (NPHT), which were chemically modified by electron beam (EB) irradiation. By irradiating a responsive interfacial surface, the orientation and selective patterning of block copolymer domains could be achieved. We demonstrated that spatially-selective lamellar orientation of polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) could be induced via modification of an underlying SAM; for instance the conversion of an NO2 group to an NH2 group, induced by EB. The lamellar orientation of PS-b-PMMA was controlled by the change in the polarity of different regions of the SAM using EB lithography. The reductive treatment of SAM substrates plays a crucial role in the orientation of block copolymer. This method might greatly simplify block copolymer DSA processes as compared to the conventional multi-step chemo-epitaxy DSA process. By examining the lamellae orientation by EB, we found that the vertical orientation persists only for appropriate an irradiation dose and annealing temperature.

AB - Directed self-assembly (DSA) was investigated on self-assembled monolayers (SAMs) of 6-(4-nitrophenoxy) hexane-1-thiol (NPHT), which were chemically modified by electron beam (EB) irradiation. By irradiating a responsive interfacial surface, the orientation and selective patterning of block copolymer domains could be achieved. We demonstrated that spatially-selective lamellar orientation of polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) could be induced via modification of an underlying SAM; for instance the conversion of an NO2 group to an NH2 group, induced by EB. The lamellar orientation of PS-b-PMMA was controlled by the change in the polarity of different regions of the SAM using EB lithography. The reductive treatment of SAM substrates plays a crucial role in the orientation of block copolymer. This method might greatly simplify block copolymer DSA processes as compared to the conventional multi-step chemo-epitaxy DSA process. By examining the lamellae orientation by EB, we found that the vertical orientation persists only for appropriate an irradiation dose and annealing temperature.

KW - Block copolymer

KW - electron beam

KW - polarity switch

KW - self-assembled monolayer

KW - lamellar orientation

U2 - 10.1117/12.2257953

DO - 10.1117/12.2257953

M3 - Article

VL - 10146

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

SN - 0277-786X

M1 - 1014613

ER -