Abstract
Irresistible Materials (IM) is a UK company spun out of the University of Birmingham. It is developing novel resist systems based on the Multi-trigger concept, and spin-on-carbon hardmask materials. IM has developed a new EUV resist that is nonmetal based, does not need a post exposure bake (PEB), and delivers high sensitivity, excellent contact hole resolution, with low LER. It is being readied for HVM through a partnership with Nano-C, Inc. (the Massachusetts based manufacturer of advanced electronic materials and chemicals). The transition to scalability will be the highlight of this discussion.
Original language | English |
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Article number | 1014328 |
Number of pages | 13 |
Journal | Proceedings of SPIE - The International Society for Optical Engineering |
Volume | 10143 |
DOIs | |
Publication status | Published - 18 May 2017 |
Keywords
- EUV Photoresist
- resolution
- molecular
- contacts holes
- volume manufacturing
- high resolution