Irresistible Materials multi-trigger resist: the journey towards high volume manufacturing readiness

Research output: Contribution to journalArticlepeer-review

Authors

  • Warren Montgomery
  • Alexandra McClelland
  • David Ure
  • John Roth
  • Alex Robinson

Colleges, School and Institutes

External organisations

  • IRRESISTIBLE MATERIALS LTD
  • IRRESISTIBLE MATERIALS LTD
  • Nano-C, Inc.

Abstract

Irresistible Materials (IM) is a UK company spun out of the University of Birmingham. It is developing novel resist systems based on the Multi-trigger concept, and spin-on-carbon hardmask materials. IM has developed a new EUV resist that is nonmetal based, does not need a post exposure bake (PEB), and delivers high sensitivity, excellent contact hole resolution, with low LER. It is being readied for HVM through a partnership with Nano-C, Inc. (the Massachusetts based manufacturer of advanced electronic materials and chemicals). The transition to scalability will be the highlight of this discussion.

Details

Original languageEnglish
Article number1014328
Number of pages13
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume10143
Publication statusPublished - 18 May 2017

Keywords

  • EUV Photoresist, resolution, molecular, contacts holes, volume manufacturing, high resolution