Improved sensitivity of multi-adduct derivatives of Fullerene

T Tada; K Uekusu; T Kananyama; T Nakayama; R Chapman; WY Cheung; L Eden; I Hussain; M Jennings; S Perkins; M Philips; Jon Preece; Elwyn Shelley

doi:10.2494/photopolymer.14.543

Improved sensitivity of multi-adduct derivatives of Fullerene

T Tada, K Uekusu, T Kananyama, T Nakayama, R Chapman, WY Cheung, L Eden, I Hussain, M Jennings, S Perkins, M Philips, Jon Preece, Elwyn Shelley

Chemistry

Research output: Contribution to journal › Article

2 Citations (Scopus)

Original language	English
Pages (from-to)	543-546
Number of pages	4
Journal	Journal of Photopolymer Science and Technology
Volume	14
Issue number	4
DOIs	https://doi.org/10.2494/photopolymer.14.543
Publication status	Published - 1 Jan 2001

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10.2494/photopolymer.14.543

Cite this

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title = "Improved sensitivity of multi-adduct derivatives of Fullerene",

author = "T Tada and K Uekusu and T Kananyama and T Nakayama and R Chapman and WY Cheung and L Eden and I Hussain and M Jennings and S Perkins and M Philips and Jon Preece and Elwyn Shelley",

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AU - Tada, T

AU - Uekusu, K

AU - Kananyama, T

AU - Nakayama, T

AU - Chapman, R

AU - Cheung, WY

AU - Eden, L

AU - Hussain, I

AU - Jennings, M

AU - Perkins, S

AU - Philips, M

AU - Preece, Jon

AU - Shelley, Elwyn

PY - 2001/1/1

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DO - 10.2494/photopolymer.14.543

M3 - Article

SN - 1349-6336

VL - 14

SP - 543

EP - 546

JO - Journal of Photopolymer Science and Technology

JF - Journal of Photopolymer Science and Technology

IS - 4

ER -