Hot-Electron Injection in Stacked-Gate Metal-Oxide-Semiconductor Field-Effect Transistors

Research output: Contribution to journalArticle

Authors

Colleges, School and Institutes

Abstract

Hot-electron injection in high dielectric constant stacked-gate metal-oxide-semiconductor field-effect transistors (MOSFETs) is studied theoretically by combining a hybrid Monte Carlo/iterative simulation of hot carrier transport with a transfer-matrix calculation of the transmission probability through the insulators. It is shown that the reduced potential barrier between the silicon and the high dielectric constant material results in high gate currents in short channel MOSFETs even at low drain voltages. The structure may therefore find applications in electrically erasable programmable read-only memory devices. (c) 2005 American Institute of Physics.

Details

Original languageEnglish
Pages (from-to)1-3
Number of pages3
JournalJournal of Applied Physics
Volume97
Issue number104501
Publication statusPublished - 1 Jan 2005