High-pressure nanolithography using low-energy electrons from a scanning tunnelling microscope

BL Weeks, A Vollmer, ME Welland, Trevor Rayment

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@article{f828f0b3b9f54f3c9a84dd3975a46142,

title = "High-pressure nanolithography using low-energy electrons from a scanning tunnelling microscope",

author = "BL Weeks and A Vollmer and ME Welland and Trevor Rayment",

year = "2002",

month = jan,

day = "1",

doi = "10.1088/0957-4484/13/1/308",

language = "English",

volume = "13",

pages = "38--42",

journal = "Nanotechnology",

issn = "1361-6528",

publisher = "IOP Publishing",

}

TY - JOUR

T1 - High-pressure nanolithography using low-energy electrons from a scanning tunnelling microscope

AU - Weeks, BL

AU - Vollmer, A

AU - Welland, ME

AU - Rayment, Trevor

PY - 2002/1/1

Y1 - 2002/1/1

UR - http://www.scopus.com/inward/record.url?scp=0036471757&partnerID=8YFLogxK

U2 - 10.1088/0957-4484/13/1/308

DO - 10.1088/0957-4484/13/1/308

M3 - Article

SN - 1361-6528

VL - 13

SP - 38

EP - 42

JO - Nanotechnology

JF - Nanotechnology

ER -