High energy X-ray phase and dark-field imaging using a random absorption mask

Research output: Contribution to journalArticle

Authors

  • Hongchang Wang
  • Yogesh Kashyap
  • Biao Cai
  • Kawal Sawhney

Colleges, School and Institutes

Abstract

High energy X-ray imaging has unique advantage over conventional X-ray imaging, since it enables higher penetration into materials with significantly reduced radiation damage. However, the absorption contrast in high energy region is considerably low due to the reduced X-ray absorption cross section for most materials. Even though the X-ray phase and dark-field imaging techniques can provide substantially increased contrast and complementary information, fabricating dedicated optics for high energies still remain a challenge. To address this issue, we present an alternative X-ray imaging approach to produce transmission, phase and scattering signals at high X-ray energies by using a random absorption mask. Importantly, in addition to the synchrotron radiation source, this approach has been demonstrated for practical imaging application with a laboratory-based microfocus X-ray source. This new imaging method could be potentially useful for studying thick samples or heavy materials for advanced research in materials science.

Details

Original languageEnglish
Article number30581
JournalScientific Reports
Volume6
Issue number1
Publication statusPublished - 1 Nov 2016