High aspect ratio etching using a fullerene derivative spin-on-carbon hardmask

Research output: Contribution to journalArticlepeer-review

Authors

Colleges, School and Institutes

Details

Original languageEnglish
Article number8328OU
Pages (from-to)n/a
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume8328
Publication statusPublished - 2012