High aspect ratio etching using a fullerene derivative spin-on-carbon hardmask

Research output: Contribution to journalArticlepeer-review

11 Citations (Scopus)
Original languageEnglish
Article number8328OU
Pages (from-to)n/a
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume8328
DOIs
Publication statusPublished - 2012

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