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Abstract
This paper demonstrates a novel facile method for fabrication of patterned arrays of gold nanoparticles on Si/SiO2 by combining electron beam lithography and self-assembly techniques. Our strategy is to use direct-write electron beam patterning to convert nitro functionality in self-assembled monolayers of 3-(4-nitrophenoxy)-propyltrimethoxysilane to amino functionality, forming chemically well-defined surface architectures on the 100 nm scale. These nanopatterns are employed to guide the assembly of citrate-passivated gold nanoparticles according to their different affinities for amino and nitro groups. This kind of nanoparticle assembly offers an attractive new option for nanoparticle patterning a silicon surface, as relevant, for example, to biosensors, electronics, and optical devices.
Original language | English |
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Pages (from-to) | 3766-3768 |
Number of pages | 3 |
Journal | Langmuir |
Volume | 20 |
Issue number | 9 |
DOIs | |
Publication status | Published - 27 Apr 2004 |
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Dive into the research topics of 'Gold nanoparticle patterning of silicon wafers using chemical e-beam lithography'. Together they form a unique fingerprint.Projects
- 1 Finished
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PLATFORM: Nanostructured Surfaces
Palmer, R., Guo, Q., Harrison, R., Heath, J., Jones, I., Li, Z., Moss, P. & Robinson, A.
Engineering & Physical Science Research Council
1/12/02 → 31/05/07
Project: Research Councils