Fullerenes

Alex Robinson; Richard Palmer; Andreas Frommhold; Dongxu Yang

Fullerenes

Alex Robinson (Inventor), Richard Palmer (Inventor), Andreas Frommhold (Inventor), Dongxu Yang (Inventor)

Research output: Patent

Abstract

The present disclosure relates to novel fullerene derivatives, positive and negative photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for high speed, fine pattern processing using, for example, ultraviolet radiation, extreme ultraviolet radiation, beyond extreme ultraviolet radiation, X-rays, electron beam and other charged particle rays.

Original language	English
Patent number	20160139506
Publication status	Published - 19 May 2016

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title = "Fullerenes",

abstract = "The present disclosure relates to novel fullerene derivatives, positive and negative photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for high speed, fine pattern processing using, for example, ultraviolet radiation, extreme ultraviolet radiation, beyond extreme ultraviolet radiation, X-rays, electron beam and other charged particle rays.",

author = "Alex Robinson and Richard Palmer and Andreas Frommhold and Dongxu Yang",

year = "2016",

month = may,

day = "19",

language = "English",

type = "Patent",

note = "20160139506",

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TY - PAT

T1 - Fullerenes

AU - Robinson, Alex

AU - Palmer, Richard

AU - Frommhold, Andreas

AU - Yang, Dongxu

PY - 2016/5/19

Y1 - 2016/5/19

N2 - The present disclosure relates to novel fullerene derivatives, positive and negative photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for high speed, fine pattern processing using, for example, ultraviolet radiation, extreme ultraviolet radiation, beyond extreme ultraviolet radiation, X-rays, electron beam and other charged particle rays.

AB - The present disclosure relates to novel fullerene derivatives, positive and negative photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for high speed, fine pattern processing using, for example, ultraviolet radiation, extreme ultraviolet radiation, beyond extreme ultraviolet radiation, X-rays, electron beam and other charged particle rays.

M3 - Patent

M1 - 20160139506

ER -

Fullerenes

Abstract

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