Research output: Patent


Colleges, School and Institutes

External organisations

  • School of Chemical EngineeringUniversity of BirminghamEdgbastonB15 2TTUnited Kingdom


The present disclosure relates to novel fullerene derivatives, positive and negative photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for high speed, fine pattern processing using, for example, ultraviolet radiation, extreme ultraviolet radiation, beyond extreme ultraviolet radiation, X-rays, electron beam and other charged particle rays.


Original languageEnglish
Patent number20160139506
Publication statusPublished - 19 May 2016