Research output: Patent
Colleges, School and Institutes
- School of Chemical EngineeringUniversity of BirminghamEdgbastonB15 2TTUnited Kingdom
The present disclosure relates to novel fullerene derivatives, positive and negative photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for high speed, fine pattern processing using, for example, ultraviolet radiation, extreme ultraviolet radiation, beyond extreme ultraviolet radiation, X-rays, electron beam and other charged particle rays.
|Publication status||Published - 19 May 2016|