Fullerene derivatives as novel resist materials for fabrication of MEMS devices by electron beam lithography

Research output: Contribution to conference (unpublished)Paper

Authors

Details

Original languageEnglish
Pages219-224
Number of pages6
Publication statusPublished - 1 Jan 1999
EventMaterials Research Society Symposium Proceedings -
Duration: 1 Jan 2006 → …

Conference

ConferenceMaterials Research Society Symposium Proceedings
Period1/01/06 → …