Fullerene derivatives as novel resist materials for fabrication of MEMS devices by electron beam lithography

Alexander Robinson, Richard Palmer, T Tada, T Kanayama, Elwyn Shelley, Jon Preece

Research output: Contribution to conference (unpublished)Paper

Original languageEnglish
Pages219-224
Number of pages6
Publication statusPublished - 1 Jan 1999
EventMaterials Research Society Symposium Proceedings -
Duration: 1 Jan 2006 → …

Conference

ConferenceMaterials Research Society Symposium Proceedings
Period1/01/06 → …

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