Fabrication of Step-and-Flash imprint lithography (S-FIL) templates using XeF2 enhanced focused Ion Beam Etching

Research output: Contribution to journalArticle

Authors

Colleges, School and Institutes

Details

Original languageEnglish
Pages (from-to)819-825
Number of pages7
JournalJournal of Applied Physics
Volume96
Issue number4
Publication statusPublished - 1 Jan 2009